发明名称 SUPPORT STRUCTURE AND PROCESSING APPARATUS
摘要 <p>OF THE DISCLOSURESUPPORT STRUCTURE AND PROCESSING APPARATUSA support structure for supporting a plurality of objects to be processed and to be disposed in a processing container structure in 'which a processing gas flows from the bottom to the top or from the top to the bottom, includes: a top plate portion; a bottom portion; and a plurality of support posts connecting the top plate portion and the bottom portion. A plurality of support portions for supporting the objects to be processed are formed in each support post along the longitudinal direction, and the pitch of the support portions is set larger on the downstream side than on the upstream side in the flow direction of the processing gas. The support structure can enhance the in-plane uniformity of the thickness of a film.formed on a processing object.FIG.11111111111111111111111111111111111111111111110111111111*G00002*</p>
申请公布号 SG177103(A1) 申请公布日期 2012.01.30
申请号 SG20110045317 申请日期 2011.06.16
申请人 TOKYO ELECTRON LIMITED 发明人 SHINJI ASARI;MITSUHIRO OKADA
分类号 主分类号
代理机构 代理人
主权项
地址