| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technology capable of removing minimum necessary amount of the damage layer in a sample piece produced by FIB processing. <P>SOLUTION: The charged particle beam device comprises a first element ion beam optical system device performing first FIB processing for forming a sample piece from a sample, a second element ion beam optical system device performing second FIB processing for removing a damage layer formed on the surface of a sample piece, and a first element detector which detects a first element existing in the damage layer. When the amount of the first element existing in the damage layer becomes smaller than a predetermined threshold, end of the second FIB processing is determined. <P>COPYRIGHT: (C)2012,JPO&INPIT |
