发明名称 CHEMICAL FEED SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To provide a technology for measuring a flow rate of a diaphragm pump. <P>SOLUTION: A chemical feed system is provided for calculating at least one of a sucked amount and a discharged amount of a chemical based on a flow rate of a working gas. The chemical feed system includes: a pump body having an internal space formed to communicate with a chemical sucking port 21b and a chemical discharging port 21c; a pump 13 having a diaphragm for partitioning into a pump chamber on a side communicating with the chemical sucking port and the chemical discharging port, and a working chamber on a side communicating with a working gas supply port; a pump driving part 59 for supplying the working gas to the working gas supply port; a control part for sucking and discharging the chemical by operating the chemical sucking port, the chemical discharging port, and the pump driving part; and a gas flow rate measuring part for measuring the flow rate of the working gas. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012017658(A) 申请公布日期 2012.01.26
申请号 JP20100153823 申请日期 2010.07.06
申请人 CKD CORP 发明人 SAKAI ATSUYUKI;YOSHIDA MASATERU;TOYODA TETSUYA
分类号 F04B49/00;F04B43/06 主分类号 F04B49/00
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