发明名称 |
MATERIAL FOR CHEMICAL VAPOR DEPOSITION AND PROCESS FOR FORMING SILICON-CONTAINING THIN FILM USING SAME |
摘要 |
A material for chemical vapor deposition containing an organic silicon-containing compound represented by formula: HSiCl(NR1R2)(NR3R4), wherein R1 and R3 each represent C1-C4 alkyl or hydrogen; and R2 and R4 each represent C1-C4 alkyl. The material is particularly suitable as a material for forming a silicon nitride thin film on a substrate by chemical vapor deposition. The use of the material allows for film formation at low temperatures ranging from 300° to 500° C. |
申请公布号 |
US2012021127(A1) |
申请公布日期 |
2012.01.26 |
申请号 |
US201013145474 |
申请日期 |
2010.02.15 |
申请人 |
ADEKA CORPORATION |
发明人 |
SATO HIROKI;MIZUO YOSHIHIDE;SAITO AKIO;UEYAMA JUNJI |
分类号 |
C23C16/34;C07F7/02;C23C16/44 |
主分类号 |
C23C16/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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