| 摘要 |
<p>Provided is a film forming apparatus which can continuously form a film without causing thermal deformation of a film-shaped base material. A film forming apparatus (1) comprises a chamber (10), a cooling roller (13), a gas supply source (16), and a plurality of catalytic wires (17). The cooling roller (13) is rotated about a rotation axis (13a) to thereby cool a film-shaped base material (F) wound around an outer peripheral surface (13b) and to convey the base material (F) inside the chamber (10). The gas supply source (16) supplies a source gas to the base material (F) wound around the outer peripheral surface (13b), and is disposed facing the outer peripheral surface (13b). The catalytic wires (17) are disposed between the outer peripheral surface (13b) and the gas supply source (16) and can be heated to the decomposition temperature of the source gas. As a result, a film can be continuously formed on the base material (F) while the base material (F) is protected from the heat of the catalytic wires (17).</p> |
