| 发明名称 |
SEMICONDUCTOR PROCESS |
| 摘要 |
A semiconductor process is disclosed. The semiconductor process includes the steps of: providing a substrate having a specific area defined thereon; and performing an etch process by using an etchant comprising H2O2 to etch the specific area for forming a recess. |
| 申请公布号 |
US2012021583(A1) |
申请公布日期 |
2012.01.26 |
| 申请号 |
US20100841174 |
申请日期 |
2010.07.22 |
| 申请人 |
WU CHUN-YUAN;YEH CHIU-HSIEN;CHIEN CHIN-CHENG |
发明人 |
WU CHUN-YUAN;YEH CHIU-HSIEN;CHIEN CHIN-CHENG |
| 分类号 |
H01L21/335;H01L21/20;H01L21/306 |
主分类号 |
H01L21/335 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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