发明名称 Semiconductor Device and Method of Forming RDL Wider than Contact Pad along First Axis and Narrower than Contact Pad Along Second Axis
摘要 A semiconductor device has a semiconductor die and first conductive layer formed over a surface of the semiconductor die. A first insulating layer is formed over the surface of the semiconductor die. A second insulating layer is formed over the first insulating layer and first conductive layer. An opening is formed in the second insulating layer over the first conductive layer. A second conductive layer is formed in the opening over the first conductive layer and second insulating layer. The second conductive layer has a width that is less than a width of the first conductive layer along a first axis. The second conductive layer has a width that is greater than a width of the first conductive layer along a second axis perpendicular to the first axis. A third insulating layer is formed over the second conductive layer and first insulating layer.
申请公布号 US2012018904(A1) 申请公布日期 2012.01.26
申请号 US201113181290 申请日期 2011.07.12
申请人 LIN YAOJIAN;FENG XIA;FANG JIANMIN;CHEN KANG;STATS CHIPPAC, LTD. 发明人 LIN YAOJIAN;FENG XIA;FANG JIANMIN;CHEN KANG
分类号 H01L29/40;H01L21/283 主分类号 H01L29/40
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