LIGHT IRRADIATION DEVICE FOR EXPOSURE APPARATUS, METHOD FOR CONTROLLING LIGHT IRRADIATION DEVICE, EXPOSURE APPARATUS, AND EXPOSURE METHOD

摘要

Provided are: a light irradiation device for an exposure apparatus, wherein luminance decrease over irradiation time of a light source unit can be suppressed; a method for controlling a light irradiation device; an exposure apparatus; and an exposure method. The light irradiation device for an exposure apparatus comprises: a plurality of light source units (73), each of which contains a light emitting unit (71) and a reflective optical system (72); a plurality of cassettes (81), each of which supports a predetermined number of light source units (73) with light source supporting parts (83) so that light from the light source units (73) is incident on the incident surface of an integrator lens (74); a supporting body (82) which comprises a plurality of cassette fitting parts (90) that fit the plurality of cassettes (81) so that light from all of the light source units (73) is incident on the incident surface of the integrator lens (74); and an optical axis angle adjustment mechanism (99) which is capable of adjusting the angle of the optical axis of each light source unit (73).