ION DOPING APPARATUS AND METHOD OF REDUCING DUST IN ION DOPING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide an ion doping apparatus that can drastically reduce the frequency of atmosphere opening treatment and cleaning treatment of an ion source and a doping chamber for removing particles generated due to hydrogen embrittlement of an inner wall, and to provide a method of reducing dust in the ion doping apparatus.

SOLUTION: A film of dichromium trioxide (Cr2O3) is formed on inner walls of an ion source and a doping chamber by supplying an element hydrogen and an element oxygen to the ion source and the doping chamber at 600°C or more and 1000°C or less. This can repair and reinforce the inner walls before the progress of the hydrogen embrittlement to provide a doping apparatus which minimizes a frequency of atmosphere opening.

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