发明名称 MANUFACTURING METHOD OF PROJECTION DEVICE, MANUFACTURING APPARATUS OF PROJECTION DEVICE, AND PROJECTION DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a projection device capable of highly accurately adjusting the positions of a reflection type light valve and a reflection type polarizing plate with respect to a projection optical device, a manufacturing method of the same, and a manufacturing apparatus of the same. <P>SOLUTION: A projection device comprises: a reflection type optical modulation element which emits modulated light produced by modulating incident light; and a reflection type polarizing plate which transmits the incident light from a light source while reflecting the modulated light to a projection optical element. A manufacturing method of the projection device includes: forming a modulation element unit in which the reflection type optical modulation element and the reflection type polarizing plate are fixed at prescribed positions; and adjusting the position of the reflection optical modulation element relative to the projection optical element by shifting the position of the modulation element unit with respect to the projection optical element. In a position adjustment step for adjusting a position in a rotating direction around axes, the position is adjusted in the rotating direction around three axes crossing each other at the center of the reflection type optical modulation element in a virtual image of the reflection type optical modulation element produced by the reflection type polarizing plate. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012018292(A) 申请公布日期 2012.01.26
申请号 JP20100155491 申请日期 2010.07.08
申请人 SEIKO EPSON CORP 发明人 OKAMURO TAKUMA;ISHIBASHI OSAMU
分类号 G03B21/14;G02F1/13;G03B21/00;H04N5/74 主分类号 G03B21/14
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