发明名称 PHOTOELECTRIC CONVERSION DEVICE AND ITS MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a photoelectric conversion device in which defects are suppressed as much as possible by filling a separate processing region of a semiconductor film with insulation resin, and provide a manufacturing method of the photoelectric conversion device. <P>SOLUTION: A photoelectric conversion device comprises a first conduction layer formed on a substrate, first, second, and third semiconductor layers formed on the first conduction layer, a second conduction layer formed on the third semiconductor layer, a first separation groove for separating into plural pieces the first conduction layer and the first, second, and third semiconductor layers, a second separation groove for separating into plural pieces the first, second, and third semiconductor layers, and a third separation groove for separating into plural pieces the second conduction layer. A structure defect existing in at least one of the first, second, and third semiconductor layers, and the first separation groove are filled with insulation resin. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012019208(A) 申请公布日期 2012.01.26
申请号 JP20110128179 申请日期 2011.06.08
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 NISHI KAZUO;HIROSE TAKASHI;ISAKA FUMITO;KUSUMOTO NAOTO
分类号 H01L31/04 主分类号 H01L31/04
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