发明名称 ELECTROLESS GOLD PLATING SOLUTION, AND ELECTROLESS GOLD PLATING METHOD
摘要 <p>The purpose of the present invention is to provide an electroless gold plating solution which can achieve the direct gold plating treatment on a film to be plated of a base metal such as nickel and palladium, can form a gold-plated coating film having a thickness of 0.1 µm or more and can form a uniform gold-plated coating film, and for which the plating operation can be carried out safely. The present invention relates to an electroless gold plating solution characterized by comprising a water-soluble gold compound and either of hexahydro-2,4,6-trimethyl-1,3,5-triazine or hexamethylenetetratemine. Hexahydro-2,4,6-trimethyl-1,3,5-triazine or hexamethylenetetramine is preferably contained in an amount of 0.1-100 g/L.</p>
申请公布号 WO2012011305(A1) 申请公布日期 2012.01.26
申请号 WO2011JP59350 申请日期 2011.04.15
申请人 ELECTROPLATING ENGINEERS OF JAPAN LIMITED;ASAKAWA, TAKANOBU;FUJINAMI, TOMOYUKI 发明人 ASAKAWA, TAKANOBU;FUJINAMI, TOMOYUKI
分类号 C23C18/44 主分类号 C23C18/44
代理机构 代理人
主权项
地址