| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an LPP system EUV light source which can sharply enhance utilization efficiency of a target material and energy while minimizing occurrence of debris and deterioration in degree of vacuum of a chamber, and to provide a light generation method thereof. <P>SOLUTION: An LPP system EUV light source comprises a vacuum chamber 12 held in a predetermined vacuum environment, a gas jet device 14 which forms a hypersonic steady gas jet 1 of a target material in the vacuum chamber so that it can be recovered, a magnetic field generator 20 which applies to the hypersonic steady gas jet a magnetic field 5 which is in parallel with the jet flow, and a laser device 16 which irradiates the hypersonic steady gas jet with condensed laser light 3. At the focal point 2 of laser light, the target material is excited to generate plasma and extreme-ultraviolet light 4 is generated therefrom. <P>COPYRIGHT: (C)2012,JPO&INPIT |
