发明名称 SUBSTRATE PROCESSING APPARATUS CONTROL SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus control system capable of supplying appropriate data. <P>SOLUTION: The substrate processing apparatus control system includes a collection unit that collects data from each of components constituting a substrate processing apparatus. The collection unit comprises a buffer that temporarily stores collected data and means for rearranging data in chronological order based on the time data attached to the data stored in the buffer. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012019199(A) 申请公布日期 2012.01.26
申请号 JP20110096790 申请日期 2011.04.25
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 KATAOKA NORIHIKO;MORI SHINICHIRO
分类号 H01L21/02 主分类号 H01L21/02
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