发明名称 |
UNSYMMETRICAL LIGAND SOURCES, REDUCED SYMMETRY METAL-CONTAINING COMPOUNDS, AND SYSTEMS AND METHODS INCLUDING SAME |
摘要 |
<p>The present invention provides metal-containing compounds that include at least one beta-diketiminate ligand, and methods of making and using the same. In some embodiments, the metal-containing compounds are homoleptic complexes that include unsymmetrical beta-diketiminate ligands. In other embodiments, the metal-containing compounds are heteroleptic complexes including at least one beta-diketiminate ligand. The compounds can be used to deposit metal-containing layers using vapor deposition methods. Vapor deposition systems including the compounds are also provided. Sources for beta-diketiminate ligands are also provided.</p> |
申请公布号 |
EP1907354(B1) |
申请公布日期 |
2012.01.25 |
申请号 |
EP20060774112 |
申请日期 |
2006.06.27 |
申请人 |
MICRON TECHNOLOGY, INC. |
发明人 |
MILLWARD, DANIEL;UHLENBROCK, STEFAN;QUICK, TIMOTHY, A. |
分类号 |
C07C251/12;C07F3/00;C07F7/00;C23C16/40;H01L21/316 |
主分类号 |
C07C251/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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