发明名称 Lift-off process for GaN films formed on SiC substrates and devices fabricated using the method
摘要 <p>A method for fabricating a high light extraction photonic device is disclosed. A lift-off layer is grown on a substrate. An epitaxial semiconductor device structure is grown on the lift-off layer such that the lift-off layer is sandwiched between the device structure and substrate. The epitaxial semiconductor structure comprises an emitter adapted to emit light in response to a bias. The device structure, lift-off layer and substrate are flip-chip mounted on a submount such that the epitaxial semiconductor device structure is sandwiched between the submount and the lift-off layer. At least a portion of the lift-off layer is removed to separate the substrate from the device structure.</p>
申请公布号 EP2410581(A1) 申请公布日期 2012.01.25
申请号 EP20110186059 申请日期 2005.03.22
申请人 CREE, INC. 发明人 NAKAMURA, SHUJI;DENBAARS, STEVEN
分类号 H01L33/00;H01L33/10;H01L33/46 主分类号 H01L33/00
代理机构 代理人
主权项
地址