发明名称 |
Lift-off process for GaN films formed on SiC substrates and devices fabricated using the method |
摘要 |
<p>A method for fabricating a high light extraction photonic device is disclosed. A lift-off layer is grown on a substrate. An epitaxial semiconductor device structure is grown on the lift-off layer such that the lift-off layer is sandwiched between the device structure and substrate. The epitaxial semiconductor structure comprises an emitter adapted to emit light in response to a bias. The device structure, lift-off layer and substrate are flip-chip mounted on a submount such that the epitaxial semiconductor device structure is sandwiched between the submount and the lift-off layer. At least a portion of the lift-off layer is removed to separate the substrate from the device structure.</p> |
申请公布号 |
EP2410581(A1) |
申请公布日期 |
2012.01.25 |
申请号 |
EP20110186059 |
申请日期 |
2005.03.22 |
申请人 |
CREE, INC. |
发明人 |
NAKAMURA, SHUJI;DENBAARS, STEVEN |
分类号 |
H01L33/00;H01L33/10;H01L33/46 |
主分类号 |
H01L33/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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