| 发明名称 |
Method for improving germanide growth and devices obtained thereof |
| 摘要 |
<p>The present invention is related to the field of semiconductor processing and, more particularly, to the formation of low resistance layers on germanium substrates.
</p> |
| 申请公布号 |
EP2031644(A3) |
申请公布日期 |
2012.01.25 |
| 申请号 |
EP20080163442 |
申请日期 |
2008.09.01 |
| 申请人 |
IMEC |
发明人 |
BRUNCO, DAVID;MEURIS, MARC |
| 分类号 |
H01L21/285 |
主分类号 |
H01L21/285 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
