发明名称 |
Charged particle beam apparatus and irradiation method |
摘要 |
<p>A charged particle beam apparatus produces little reduction in resolution when the beam is inclined with respect to a sample. The trajectory of a primary beam (4) is deflected by a deflector or changed by a movable aperture such that the beam is incident on a plurality of lenses (5 and 7) off the axes thereof. A means is provided to control the off-axis trajectory of the beam such that an aberration produced by the objective lens (7) when the beam is inclined can be cancelled by an aberration produced by the other lens (5).
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申请公布号 |
EP2023373(A3) |
申请公布日期 |
2012.01.25 |
申请号 |
EP20080017746 |
申请日期 |
2003.09.10 |
申请人 |
JP |
发明人 |
JP;JP;JP;JP;JP;JP |
分类号 |
H01J37/153;G01Q20/02;G01Q30/02;H01J3/14;H01J29/70;H01J37/28 |
主分类号 |
H01J37/153 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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