METHOD OF CLEANING A THIN FILM FORMING APPARATUS, THIN FILM FORMING METHOD, AND THIN FILM FORMING APPARATUS

摘要

PURPOSE: A thin film forming apparatus and a cleaning method thereof are provided to form down time short while reducing a maintenance task. CONSTITUTION: A reaction tube(2) has a dual tube structure which is composed of an inner tube(3) and an outer tube(4). A manifold(5) which is formed into a cylindrical shape is arranged in the lower side of the outer tube. A thermal insulator(11) is installed in around the reaction tube in order to surround the reaction tube. A heater(12) for temperature rising which is composed of a resistance heating body is installed in the inner wall of the thermal insulator. A plurality of processing gas induction pipes(13) is inserted in the side of the manifold.