发明名称 A MONITORING SYSTEM BASED ON ETCHING OF METALS
摘要 Compositions, devices and processes related to etching of a very thin layer or fine particles of a metal are disclosed for monitoring a variety of parameters, such as time, temperature, time-temperature, thawing, freezing, microwave, humidity, ionizing radiation, sterilization and chemicals. These devices have capabilities of producing a long and sharp induction pepod of an irreversible visual change The devices are composed of an indicator comppsing a very thin layer of a metal (e g, polyester film having an extremely thin, e g, about one hundred Angstroms layer of aluminum) and an activator, e g, a reactant, such as water, water vapor, an acid, a base, oxidizing agent or their precursors, which is capable of reacting with the said indicator. The indicator retains its opacity and metallic luster, e g, silvery white, mirror like finish of aluminum layer for a long time. The activator destroys the indicator layer including the naturally formed oxide layer.
申请公布号 ZA201009026(B) 申请公布日期 2012.01.25
申请号 ZA20100009026 申请日期 2010.12.14
申请人 GORDHAN PATEL 发明人 PATEL GORDHAN
分类号 G01D 主分类号 G01D
代理机构 代理人
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