sputtering deposition equipment and method for forming plain electrode of liquid crystal display device,申请号KR20040114850-传众专利搜索

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发明名称	sputtering deposition equipment and method for forming plain electrode of liquid crystal display device
摘要
申请公布号	KR101107686(B1)	申请公布日期	2012.01.25
申请号	KR20040114850	申请日期	2004.12.29
申请人		发明人
分类号	G02F1/13	主分类号	G02F1/13
代理机构		代理人
主权项
地址

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