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发明名称
Method for forming Isolation Film of Semiconductor Device
摘要
申请公布号
KR101107228(B1)
申请公布日期
2012.01.25
申请号
KR20040105473
申请日期
2004.12.14
申请人
发明人
分类号
H01L21/76
主分类号
H01L21/76
代理机构
代理人
主权项
地址
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