发明名称 |
VAPOR DEPOSITION REACTOR SYSTEM AND METHODS THEREOF |
摘要 |
<p>Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a showerhead assembly is provided which includes a body having a centralized channel extending through upper and lower portions of the body and extending parallel to a central axis of the body. The showerhead assembly contains an optional diffusion plate having a first plurality of holes and disposed within the centralized channel, an upper tube plate having a second plurality of holes and disposed within the centralized channel below the diffusion plate, a lower tube plate having a third plurality of holes and disposed within the centralized channel below the upper tube plate, and a plurality of tubes extending from the upper tube plate to the lower tube plate. Each tube is coupled to and in fluid communication with individual holes of the upper and lower tube plates.</p> |
申请公布号 |
EP2409318(A2) |
申请公布日期 |
2012.01.25 |
申请号 |
EP20100754006 |
申请日期 |
2010.03.16 |
申请人 |
ALTA DEVICES, INC. |
发明人 |
HE, GANG;HIGASHI, GREGG;SORABJI, KHURSHED;HAMAMJY, ROGER;HEGEDUS, ANDREAS |
分类号 |
H01L21/205;H05H1/34 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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