发明名称 |
Method of manufacturing a piezoelectric transistor |
摘要 |
According to the present application, a method of manufacturing a piezoelectric transistor may include forming a cavity over a substrate, such as a semiconductor substrate. The method may include depositing and patterning metal material over a portion of a cavity, and may include depositing an oxide film over a cavity and/or patterned metal material. Piezoelectric material may be deposited over an oxide film and patterned to avoid connection with metal material. The method may include depositing a second oxide film over a substrate including piezoelectric material. Metal wiring may be formed and may apply voltage to piezoelectric material that may be in contact with a semiconductor substrate. |
申请公布号 |
US8099842(B2) |
申请公布日期 |
2012.01.24 |
申请号 |
US20090553985 |
申请日期 |
2009.09.04 |
申请人 |
JEONG EUN-SOO;DONGBU HITEK CO., LTD. |
发明人 |
JEONG EUN-SOO |
分类号 |
H01L41/053;H01L41/22;H04R17/10 |
主分类号 |
H01L41/053 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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