发明名称 Method of manufacturing a piezoelectric transistor
摘要 According to the present application, a method of manufacturing a piezoelectric transistor may include forming a cavity over a substrate, such as a semiconductor substrate. The method may include depositing and patterning metal material over a portion of a cavity, and may include depositing an oxide film over a cavity and/or patterned metal material. Piezoelectric material may be deposited over an oxide film and patterned to avoid connection with metal material. The method may include depositing a second oxide film over a substrate including piezoelectric material. Metal wiring may be formed and may apply voltage to piezoelectric material that may be in contact with a semiconductor substrate.
申请公布号 US8099842(B2) 申请公布日期 2012.01.24
申请号 US20090553985 申请日期 2009.09.04
申请人 JEONG EUN-SOO;DONGBU HITEK CO., LTD. 发明人 JEONG EUN-SOO
分类号 H01L41/053;H01L41/22;H04R17/10 主分类号 H01L41/053
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