发明名称 |
Method and apparatus for calibrating optical path degradation useful for decoupled plasma nitridation chambers |
摘要 |
Methods for matching semiconductor processing chambers using a calibrated spectrometer are disclosed. In one embodiment, plasma attributes are measured for a process in a reference chamber and a process in an aged chamber. Using a calibrated light source, an optical path equivalent to an optical path in a reference chamber and an optical path in an aged chamber can be compared by determining a correction factor. The correction factor is applied to adjust a measured intensity of plasma radiation through the optical path in the aged chamber. Comparing a measured intensity of plasma radiation in the reference chamber and the adjusted measured intensity in the aged chamber provide an indication of changed chamber conditions. A magnitude of change between the two intensities can be used to adjust the process parameters to yield a processed substrate from the aged chamber which matches that of the reference chamber. |
申请公布号 |
US8101906(B2) |
申请公布日期 |
2012.01.24 |
申请号 |
US20080247468 |
申请日期 |
2008.10.08 |
申请人 |
TALLAVARJULA SAIRAJU;PRADHAN KAILASH;NGUYEN HUY Q.;LI JIAN;APPLIED MATERIALS, INC. |
发明人 |
TALLAVARJULA SAIRAJU;PRADHAN KAILASH;NGUYEN HUY Q.;LI JIAN |
分类号 |
G12B13/00 |
主分类号 |
G12B13/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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