| 摘要 |
The invention relates to the simulation method and apparatus used in plasma modeling. It includes a method to transform transient formulations of the phenomenological plasma model into a quasi-stochastic spatial formulation. Specifically, the invention aids in decreasing computational time for the modeling of plasma in a plasma processing system, particularly those involving two different time-based parameters. The invention is particularly described in connection with plasma simulations used for the optimization dual-frequency capacitively-coupled plasma etching systems. |
