发明名称 Fabrication method for semiconductor device
摘要 A semiconductor device fabrication method can improve yield of semiconductor devices and decrease (or prevent) waste of non-defective semiconductor chips. This fabrication method has a step of performing characteristic inspection after packaging a semiconductor chip every time a semiconductor chip layer is formed. The fabrication method makes another semiconductor chip layer on this semiconductor chip layer only when the inspection indicates that the semiconductor chip is a non-defective product.
申请公布号 US8101435(B2) 申请公布日期 2012.01.24
申请号 US20110929914 申请日期 2011.02.24
申请人 SHIZUNO YOSHINORI;LAPIS SEMICONDUCTOR CO., LTD. 发明人 SHIZUNO YOSHINORI
分类号 H01L21/66 主分类号 H01L21/66
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