发明名称 Adjustable anode assembly for a substrate wet processing apparatus
摘要 An adjustable anode assembly for a wet processing apparatus to allow selective tuning of the electrical field density distribution within a wet process chemical of the apparatus, which in turn allows the process specification or specifications to be selectively varied across the process surface of a wafer when processed by the apparatus. The adjustable anode assembly includes an anode which may be divided into several plates, at least one of which is capable of being moved from a first plane to at least a second plane.
申请公布号 US8101052(B2) 申请公布日期 2012.01.24
申请号 US20060563515 申请日期 2006.11.27
申请人 HSIAO YI-LI;YU CHEN-HUA;WANG JEAN;SHEU LAWRANCE;TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 HSIAO YI-LI;YU CHEN-HUA;WANG JEAN;SHEU LAWRANCE
分类号 C25D17/12;C25B9/12 主分类号 C25D17/12
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