发明名称 Capacitor of semiconductor device and method for manufacturing the same
摘要 A capacitor of a semiconductor device and a method for manufacturing the same includes a lower metal layer on and/or over a semiconductor substrate; an insulating layer formed on and/or over the lower metal layer with step difference; and an upper electrode on and/or over the insulating layer pattern, wherein a top corner of the upper electrode is rounded so that a curvature pattern is formed on the top corner of the upper electrode.
申请公布号 US8101493(B2) 申请公布日期 2012.01.24
申请号 US20090648910 申请日期 2009.12.29
申请人 LEE YONG-JUN;DONGBU HITEK CO., LTD. 发明人 LEE YONG-JUN
分类号 H01L29/02 主分类号 H01L29/02
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