| 摘要 |
<P>PROBLEM TO BE SOLVED: To detect flaws in a nano-order patterns, which are smaller than the wavelength of the illumination light, formed on a nano imprint mold. <P>SOLUTION: The flaw inspection device 10 comprises: a light source 14 irradiating illumination light to a translucent nano imprint mold 12 on which nano-size predetermined patterns are formed, while the wavelength of the illumination light is larger than the nano-size; a half mirror 18 for dividing the light into two lights which is transmitted through the nano imprint mold 12 irradiated by the illumination light; deflectors 20A and 20B for deflecting the each two lights so that the two divided lights make lateral deviations in a predetermined direction; a phase shifter 28 for shifting the light phase of at least one of the two lights so that the phase difference ϕ of the two deflected lights becomes π-Δ(-90°<Δ<90°); a half mirror 30 for multiplexing the two phase shifted lights; an image-forming lens 32 for image-forming the multiplexed lights; and an imaging device 34 for picking up the formed optical image. <P>COPYRIGHT: (C)2012,JPO&INPIT |
