发明名称 METHOD FOR FABRICATING AN INTERPOSER
摘要 Method for fabricating an interposer is provided. A substrate is provided having thereon at least a conductive via and at least a flange. The flange is bonded on the substrate and shades a portion of the via. A photoresist layer is formed on the interior surface of the via, on a contact surface of the flange and on an inner surface of the flange opposite to the contact surface. An opening is formed in the photoresist layer to expose a portion of the contact surface of the flange, while the photoresist layer still covers the interior surface of the via and the inner surface of the flange. A plating layer is formed on the exposed contact surface of the flange. The photoresist layer is then removed.
申请公布号 US2012015304(A1) 申请公布日期 2012.01.19
申请号 US20100837462 申请日期 2010.07.15
申请人 LEE CHANG-MING;LIU WEN-FANG;HUANG SHIH-JUNG;SU LING-KAI 发明人 LEE CHANG-MING;LIU WEN-FANG;HUANG SHIH-JUNG;SU LING-KAI
分类号 G03F7/20;B05D5/12 主分类号 G03F7/20
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