| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus capable of performing uniform treatment by light even on a large sized substrate. <P>SOLUTION: The substrate treatment apparatus includes a treatment chamber 13 having a substrate mounting part 33 for mounting a substrate 32, a light-emitting part 11 which is provided outside the treatment chamber and irradiates the inside of the treatment chamber with light, a plurality of transmission windows 15 for transmitting light which are provided in a partition wall for separating the inside and outside of the treatment chamber, a transmission window supporting member 16 which is provided in a transmission window boundary part between the transmission windows and supports the transmission windows, gas piping 21 which has a plurality of gas inlets 23 for introducing a gas for treatment into the treatment chamber, and a gas discharge part which discharges the gas in the treatment chamber out of the treatment chamber, wherein the plurality of gas inlets are provided in the transmission window boundary part. <P>COPYRIGHT: (C)2012,JPO&INPIT |
