| 摘要 |
PURPOSE: A photoelectric device and a manufacturing method thereof are provided to arrange an electrode patterned into an uneven shape by only evaporating transparent conductive materials on an uneven layer, thereby preventing increase of process time and process cost by a wet etching process. CONSTITUTION: An uneven layer(120) including an upper surface patterned into an uneven shape is arranged on a substrate(110). A first electrode(130) is arranged on the uneven layer. A photoelectric layer(140) including a plurality of semiconductor layers(141,142,143) is arranged on the first electrode. The photoelectric layer generates electromotive force by an electron-hole pair. A second electrode(150) including a conductive material is arranged on the photoelectric layer. |
