DC VOLTAGE CHARGING OF CATHODE FOR PLASMA STRIKING
摘要
Methods for processing photomasks are provided herein. In some embodiments, a method for processing a photomask may include providing a photomask to a substrate support within a process chamber; providing a process gas to the process chamber having the photomask disposed therein; providing a negative or zero voltage to a substrate support cathode having the photomask disposed thereon; providing a source RF power to an anode coupled to the process chamber to ignite the process gas to form a plasma; and processing the photomask.
申请公布号
WO2011119471(A3)
申请公布日期
2012.01.19
申请号
WO2011US29160
申请日期
2011.03.21
申请人
APPLIED MATERIALS, INC.;OUYE, ALAN HIROSHI;BIVENS, DARIN;KNICK, DAVID