发明名称 APPARATUS AND METHOD OF POLISHING GLASS SUBSTRATE, AND METHOD OF MANUFACTURING GLASS SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a glass substrate product with reduced surface defect due to foreign matter, and to provide a double-side polishing apparatus for polishing a glass substrate into the glass substrate product with reduced surface defect due to foreign matter, a method of polishing the glass substrate, and a method of manufacturing the glass substrate using the polishing method. <P>SOLUTION: For use in a process of polishing the glass substrate for polishing a principal plane of the glass substrate having a plate form including upper and lower principal planes and side faces, the double-side polishing apparatus having a mist generating nozzle for spraying a misty liquid onto the glass substrate, the method of polishing the glass substrate using the double-side polishing apparatus, and the method of manufacturing the glass substrate including the polishing process using the method of polishing the glass substrate are provided. The invention can provide the glass substrate product with remarkably reduced surface defect due to foreign matter. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012011511(A) 申请公布日期 2012.01.19
申请号 JP20100151170 申请日期 2010.07.01
申请人 ASAHI GLASS CO LTD 发明人 YOKOTA MASAICHI;OWADA TOSHIKI;MANNAMI KAZUO
分类号 B24B37/08;B24B37/00;C03C19/00;G11B5/84 主分类号 B24B37/08
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