METHOD FOR MANUFACTURING HALF-MIRROR SUBSTRATE AND HALF-MIRROR SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing half-mirror substrates and a half-mirror substrate capable of suppressing the generation of warpage without decreasing the reflectivity of light.

SOLUTION: A half-mirror substrate 1 in accordance with the present embodiment includes a PMMA substrate 10 and a reflection coating layer 30 formed on the backside of the PMMA substrate 10. The reflection coating layer 30 is formed with a metal reflection film (an Sn film 31) formed on the surface of the PMMA substrate 10, and a protective film (an SiO film 32) formed to cover the Sn film 31. The surface of the Sn film 31 is formed with a stannic oxide layer 33 with SnO2defined as a major component. Furthermore, the SiO film 32 has a low water vapor barrier property.

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