| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate processing device capable of uniformly performing chemical solution processing on a plurality of substrates, by making the temperature of chemical solution in a processing tank uniform during the chemical solution processing. <P>SOLUTION: A substrate processing device 1 comprises a processing tank 10 having a pair of sidewalls 10a and 10b opposite to each other, and storing chemical solution to perform chemical solution processing on a plurality of substrates; a holding portion 21 raising and holding the plurality of the substrates; and a substrate holding mechanism 20 coupled to the holding portion 21, having a back portion 22 interposed between the substrate held by the holding portion 21 and one sidewall 10a of the processing tank 10 when carried into the processing tank 10, and immersing the substrate held by the holding portion 21 in the chemical solution. The processing tank 10 is provided with a heater 80 for heating the stored chemical solution. The heater 80 has a first heater 81 provided on the one sidewall 10a, and a second heater 82 provided on the other sidewall 10b. An output of the first heater 81 and an output the second heater 82 are individually controlled. <P>COPYRIGHT: (C)2012,JPO&INPIT |
