| 摘要 |
PURPOSE: A vacuum processing apparatus is provided to control time which is required for transferring and loading a substrate by controlling the footprint of a whole device. CONSTITUTION: A preparatory vacuum chamber(2a) for carrying-in carries a substrate from an atmospheric pressure mode. The preparatory vacuum chamber(2b) for carrying-out takes out the substrate, which is processed at a process station, to the atmospheric pressure mode. A transfer module(12) takes out the substrate, in which processing is completed, to the preparatory vacuum chamber. A controller(20) controls the driving of a vacuum processing device. A loader(23) includes a heater for heating the substrate and an electrostatic chuck for electrostatically absorbing the substrate.
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