| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device that reduces the number of times that a stage is moved from when a target exposure glass substrate is mounted on the stage of the exposure device to when the alignment of a photo mask and the glass substrate is completed. <P>SOLUTION: The exposure device includes: an exposure power source; an exposure light control mechanism; a substrate stage position adjustment mechanism; an image recognition mechanism for alignment marks; and a mechanism for storing and calculating position information by using the image information, etc. This exposure device is provided with mechanisms configured such that each time a target exposure substrate is mounted on the stage, the target exposure substrate is moved to the initial position based on the position information, the target exposure substrate is moved stepwise based on another position information until the predetermined allowable difference between the alignment marks of the photo mask and the target exposure substrate is obtained, the position after the movement is stored as position information, information about the initial position of the target exposure substrate to be exposed next is calculated based on the stored position information and is set as position information. <P>COPYRIGHT: (C)2012,JPO&INPIT |
