| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus suitable for the formation of polyimide film by vapor deposition polymerization. <P>SOLUTION: A substrate treatment apparatus includes an external pipe constituting a chamber which can be vented by a vacuum pump; an internal pipe provided inside the external pipe, in which a substrate is disposed; a gas supply section for introducing gas into the internal pipe; a heater for heating the substrate, the external pipe and the internal pipe; and a trap section provided between the external pipe and the internal pipe. In the substrate treatment apparatus, the substrate is heated to a first temperature by the heater, whereby the gas supplied from the gas supply section is subjected to a chemical reaction, or vapor deposition polymerization, and film produced by the vapor deposition polymerization is formed on the surface of the substrate, while film produced by the vapor deposition polymerization of the gas flowing in from an opening provided in the internal pipe is also formed in the trap section. <P>COPYRIGHT: (C)2012,JPO&INPIT |
