METHOD FOR DEPOSITING A LAYER ON THE SURFACE OF A SUBSTRATE

摘要

The aim of the invention is to provide a method for depositing a layer on at least part of the surface of a substrate by at least partially immersing the substrate in a solution including a solvent and at least one compound for forming the layer, then drying the substrate, which is carried out at least partially in an atmosphere which is isolated from the solution. According to the invention, the immersion in the solution and the drying of the substrate are carried out in a single chamber in a controlled atmosphere.