发明名称 BAFFLE PLATE UNIT AND GAS WIPING DEVICE USING SAME
摘要 <p>A baffle plate unit (24) has a pair of baffle plates (22), and a position adjustment mechanism (23) that adjusts the position with respect to the ends in the width direction of a metal band of the pair of baffle plates (22). The position adjustment mechanism (23) has a pair of electromagnetic wave sensor units (32) that detect the position of each end in the width direction of the metal band (1), and controls the position of the baffle plates (22) on the basis of the detection values using a control unit (33). Each electromagnetic wave sensor unit (32) has a detector (38) that: emits electromagnetic waves, and has an antenna that receives the magnetic waves reflected by the ends in the width direction of the metal band (1); and a body (37). The detectors (38) are disposed in a fixed manner at positions that are spaced a predetermined length from the ends in the width direction of the metal band (1).</p>
申请公布号 WO2012008400(A1) 申请公布日期 2012.01.19
申请号 WO2011JP65772 申请日期 2011.07.11
申请人 JP STEEL PLANTECH CO.;MAKI KENTARO;SEKIGUCHI SHUTAKU;HASHIMOTO KAZUNORI;HASEBE TATSUHIKO 发明人 MAKI KENTARO;SEKIGUCHI SHUTAKU;HASHIMOTO KAZUNORI;HASEBE TATSUHIKO
分类号 C23C2/20 主分类号 C23C2/20
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