发明名称 PATTERN STRUCTURE FOR INTERSTAGE PROBE, INTERSTAGE MEASUREMENT METHOD, AND MULTI-CHIP MODULE HIGH-FREQUENCY CIRCUIT
摘要 <P>PROBLEM TO BE SOLVED: To provide a pattern structure for an interstage probe, that can measure S parameters between stages of a module including multiple stages of transistors, an interstage measurement method, and a multi-chip module high-frequency circuit. <P>SOLUTION: A pattern structure for an interstage probe comprises a dielectric substrate, a first signal transmission line disposed on a first surface of the dielectric substrate, a pair of first ground terminal electrodes disposed adjacent to the first signal transmission line on the first surface of the dielectric substrate, a first VIA hole disposed below the first ground terminal electrode, and a rear surface ground electrode disposed on a second surface opposite to the first surface of the dielectric substrate and connected to the first ground terminal electrode via the first VIA hole. The first signal transmission line can be connected to a signal terminal of a high-frequency probe, and the pair of first ground terminal electrodes can be connected to a pair of ground terminals of the high-frequency probe. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012013664(A) 申请公布日期 2012.01.19
申请号 JP20100154666 申请日期 2010.07.07
申请人 TOSHIBA CORP 发明人 TAKAGI KAZUTAKA
分类号 G01R31/28;H01L21/338;H01L23/12;H01L29/778;H01L29/812 主分类号 G01R31/28
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