发明名称 |
FILM-FORMING APPARATUS AND METHOD FOR CLEANING FILM-FORMING APPARATUS |
摘要 |
<p>Provided is a film-forming apparatus which is safe for a cleaning worker and which makes it possible for attached matter inside a vacuum chamber to be cleaned within a shorter period of time and at a lower cost than with a conventional apparatus, and also provided is a method for cleaning the film-forming apparatus. A hollow tank (19) formed of a material that does not dissolve in a cleaning solution which can dissolve film-forming particles is connected to a vacuum chamber (11) of a film-forming apparatus (10a), and a drainage outlet (15) is disposed in the bottom surface of the vacuum chamber (11). After a substrate (21) is carried out of the vacuum chamber (11), the cleaning solution is introduced from the tank (19) into the vacuum chamber (11), the film-forming particles attached inside the vacuum chamber (11) come into contact with the cleaning solution, a film-forming material is dissolved in the cleaning solution, and the cleaning solution is discharged from the drainage outlet (15) to outside of the vacuum chamber (11).</p> |
申请公布号 |
WO2012008455(A1) |
申请公布日期 |
2012.01.19 |
申请号 |
WO2011JP65896 |
申请日期 |
2011.07.12 |
申请人 |
ULVAC, INC.;HIDA, MASANORI;ODAGI, HIDEYUKI;SHIMADA, TETSUYA |
发明人 |
HIDA, MASANORI;ODAGI, HIDEYUKI;SHIMADA, TETSUYA |
分类号 |
C23C14/00;C23C14/24;C23C14/34;C23C16/44 |
主分类号 |
C23C14/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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