| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for a color filter protective film having excellent alkali developability, excellent exposure sensitivity and excellent resolution in which a cured product of the photosensitive resin composition is excellent in adhesion to a substrate and elastic recovery property even when employing low temperature treatment. <P>SOLUTION: An alkali developable negative photosensitive resin composition contains a polyfunctional (meth)acrylate monomer (A) containing a various acidic groups or salts thereof; a siloxane compound (B) having two or more hydrolyzable alkoxy groups; and a photo-radical polymerization initiator (C). The acid value based on the total weight of (A) to (C) in the photosensitive resin composition is 10 to 110 mgKOH/g, and the (meth)acryloyl group concentration based on the total weight of (A) to (C) in the photosensitive resin composition is 6.5 to 10.0 mmol/g. <P>COPYRIGHT: (C)2012,JPO&INPIT |
