发明名称 |
RESIDUE REMOVING APPARATUS AND RESIDUE REMOVING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a residue removing apparatus and a residue removing method capable of adequately removing the residue with a brush consisting of a soft material in a method for removing the residue by brush rotation. <P>SOLUTION: The residue removing apparatus for removing a residue of an anisotropic conductive film remaining on a substrate includes a brush which abuts on the residue and rotates by receiving predetermined driving force. A portion abutting on the residue comprises: a plant resin; and pressuring means for applying a pressure for removing the residue to an abutting portion between the brush and the residue. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012015208(A) |
申请公布日期 |
2012.01.19 |
申请号 |
JP20100148193 |
申请日期 |
2010.06.29 |
申请人 |
NEC EMBEDDED PRODUCTS LTD |
发明人 |
SUNAGA SHUICHI;KANAYA YUKIYASU |
分类号 |
H05K3/26;B08B1/04;H01L21/304;H01L21/60;H05K1/14;H05K3/32;H05K3/34 |
主分类号 |
H05K3/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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