发明名称 RESIDUE REMOVING APPARATUS AND RESIDUE REMOVING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a residue removing apparatus and a residue removing method capable of adequately removing the residue with a brush consisting of a soft material in a method for removing the residue by brush rotation. <P>SOLUTION: The residue removing apparatus for removing a residue of an anisotropic conductive film remaining on a substrate includes a brush which abuts on the residue and rotates by receiving predetermined driving force. A portion abutting on the residue comprises: a plant resin; and pressuring means for applying a pressure for removing the residue to an abutting portion between the brush and the residue. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012015208(A) 申请公布日期 2012.01.19
申请号 JP20100148193 申请日期 2010.06.29
申请人 NEC EMBEDDED PRODUCTS LTD 发明人 SUNAGA SHUICHI;KANAYA YUKIYASU
分类号 H05K3/26;B08B1/04;H01L21/304;H01L21/60;H05K1/14;H05K3/32;H05K3/34 主分类号 H05K3/26
代理机构 代理人
主权项
地址