| 摘要 |
A manufacturing process for the preparation of radiolabeled compounds of formula (I) includes reacting compounds of formula (II) with a source of readionuclide of a halogen in the presence of an oxidant under acidic condition, wherein: *I is I, I, I or I; R is lower alkyl, optionally substituted with one or more fluorine atoms; Q is C(O), O, NR', S, S(O), C(O), (CH); Y is C(O), O, NR', S, S(O), C(O), (CH); R is H, C(O), S(O), C(O); Z is H, C-C alkyl, benzyl, substituted benzyl or trialkylsilyl; m is O, 1, 2, 3, 4 or 5; n is O, 1, 2, 3, 4, 5 or 6; and p is O, 1, 2, 3, 4, 5 or 6. |
