发明名称 METHOD AND APPARATUS FOR POSITIONING ELECTRON BEAM DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method and apparatus for positioning an electron beam device, and provide a method for positioning an electron beam with less periodical fluctuation and an electron beam apparatus having the function. <P>SOLUTION: An electron beam device comprises: an electron source 1 for generating an electron beam; an optical system for accelerating, decelerating, converging, and deflecting the electron beam; a control system for scanning the electron beam or for controlling blanking; a stage 6 for holding a material 7 which is irradiated with the electron beam; a stage length measurement system 16a for measuring the position of the stage 6; an electron detection section 18 for detecting the electron beam emitted from the material 7; and a signal processing system 19 for processing a detection signal obtained from the electron detection section 18. A periodic signal whose amplitude and phase can be adjusted is added to a compensation signal from the stage length measurement system 16a. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012015227(A) 申请公布日期 2012.01.19
申请号 JP20100148528 申请日期 2010.06.30
申请人 JEOL LTD 发明人 OZAWA KANJI
分类号 H01L21/027;G03F7/20;H01J37/20;H01J37/28;H01L21/68 主分类号 H01L21/027
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