| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a magnetic recording medium in which a resist used as a mask when ions are injected can be efficiently removed. <P>SOLUTION: After completion of ion injection treatment, a resist pattern is subjected to fluorine treatment before the resist pattern is ashed. By the fluorine treatment, the resist pattern deteriorated by irradiation of the ions is converted into substance suitable for removal treatment by the ashing. This enables the resist pattern to be efficiently removed in an ashing step. Moreover, the magnetic recording medium having high surface flatness can be stably manufactured by reducing a residual amount of resist. <P>COPYRIGHT: (C)2012,JPO&INPIT |
