发明名称 SUBSTRATE MOUNTING STAGE, SUBSTRATE TREATMENT DEVICE, AND SUBSTRATE TREATMENT SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To provide a substrate mounting stage, a substrate treatment device and a substrate treatment system capable of performing temperature management and temperature control of peripheral edge parts and central parts of substrates independently with precision, respectively. <P>SOLUTION: A substrate mounting stage for mounting the substrates thereon includes: a peripheral edge mounting member on which the peripheral edge parts of the substrates are mounted to perform temperature control; a center mounting member on which the central parts of the substrates are mounted to perform the temperature control; and a support base which supports the peripheral edge mounting member and the center mounting member. In the substrate mounting stage, a gap between the peripheral edge mounting member and the center mounting member is formed, and the peripheral edge mounting member and the center mounting member do not come into contact with each other. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012015285(A) 申请公布日期 2012.01.19
申请号 JP20100149652 申请日期 2010.06.30
申请人 TOKYO ELECTRON LTD 发明人 ODAGIRI MASAYA;MURAKI YUSUKE;FUJIWARA HITOSHI
分类号 H01L21/683;H01L21/3065 主分类号 H01L21/683
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